March Plasma CS-1701 Anisotropic RIE Etching System Start Price USD 16,990.00 Current Price USD 16,990.00 Time Left - Bid Count 0 Buy It Now Price - Reserve Price - Start Time Friday, October 10, 2008 End Time Friday, October 17, 2008 Location California See more about 'March Plasma CS-1701 Anisotropic RIE Etching System' Description  This is a March Plasma CS-1701 Anisotropic RIE Plasma System.The March CS 1701 Reactive Ion Etching system delivers performance often associated with high- investment etching tools. The system is excellent for metal etching, silicide etching and etching of III-V compounds, anisotropic etching of nitrides, oxides and polyimides. Key performance features of the CS 1701 system include the large DC bias and the ability to control process pressure independent of gas flow. The system allows users a wide variety of etch profiles ranging from anisotropic requiring high aspect ratios to sloped walls.The manual for this unit may be found on the marchplasma.com website:http://www.marchplasma.com/pdf/CS1701.pdf This unit was used by a local Silicon Valley company, it looks in great shape and comes from a working facility.This unit should still be in perfect working condition.It will come fully guaranteed, with 7 day DOA warranty (right of return), contact us within 7 days of receipt for any returns.No returns accepted beyond the 7 day period.Payment is by Paypal, bank transfer, or check (checks must wait for clearance).International buyers, please contact us via email prior to bidding.No local pickups please, this unit will be packed and shipped from our client's facility upon payment.Thank you for your interest.     SquareTrade © AP6.0 Place a Bid!